Calibration Mixture Gas 99.9999% High Purity CF4/O2 Gas Mixture in Hydrogen & Argon Balance Semiconductor Plasma Etching

About Product

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This ultra-high purity 99.9999% (6N) Calibration Mixture is a specialized process gas solution engineered specifically for the rigorous demands of Semiconductor Plasma Etching and Advanced Thin-Film processes. By precisely blending Carbon Tetrafluoride (CF4) and Oxygen (O2) within a balanced matrix of Hydrogen (H2) and Argon (Ar), this mixture provides the exact chemical synergy required to control etch selectivity and profile anisotropy in sub-nanometer fabrication. The 6N-grade purity ensures that trace metallic impurities and moisture are virtually non-existent, preventing wafer contamination and significantly enhancing device yield for complex architectures like 3D NAND and FinFET

The inclusion of Argon provides the necessary ion bombardment energy for physical sputtering, while the Hydrogen/Oxygen ratio is meticulously calibrated to tune the polymer passivation layers, ensuring high-aspect-ratio trenches with perfectly vertical sidewalls. Every cylinder is prepared using advanced gravimetric mixing and undergo proprietary internal passivization to guarantee that these reactive components remain stable and do not deviate from the specified concentration over time. Provided with a comprehensive Certificate of Analysis (CoA) and traceable to international standards, this mixture is the ideal choice for R&D labs and high-volume semiconductor Fabs requiring absolute consistency in their plasma chemistry. This "all-in-one" balanced mixture simplifies gas delivery systems by reducing the number of individual gas lines needed, thereby minimizing potential leak points and streamlining the mass flow control (MFC) calibration process

 

About Us

AGEM was established in 2008 as a multinational professional manufacturer and service provider of gas equipment, headquartered in Taiwan, China. With 16 years of dedicated industry expertise, its global footprint, superior manufacturing craftsmanship, and comprehensive product portfolio have solidified its status as a benchmark enterprise in the gas equipment sector. The company adheres to a globalization development strategy, establishing modern production bases in Chinese Mainland, Taiwan, China, and India, forming a production and service network that covers Asia and extends globally. Each base is equipped with intelligent production lines and precision testing equipment, enabling full-process control from raw material processing to finished product delivery. With annual production capacity consistently ranking among industry leaders, the company can swiftly respond to the diverse needs of global clients. The core business focuses on gas-related core equipment, encompassing a full range of products including various industrial gases, specialized gas valves, high-pressure cylinders, lightweight aluminum cylinders, and high-precision pressure reducers. These products are widely applied in critical sectors such as chemicals, electronics, healthcare, and energy. Leveraging profound technical expertise, the products have obtained ISO9001 Quality Management System certification and multiple authoritative international certifications, including ASME certification for high-pressure equipment, CE-PED certification for EU market access, and IECEx explosion-proof certification for global application. Key performance indicators such as sealing performance, pressure resistance, and safety protection have achieved internationally advanced levels. The company consistently prioritizes technological innovation as its core competitive strength, assembling an international R&D team and continuously investing in technological breakthroughs

       

FAQs

What is the lead time for custom 99.9999% (6N) purity mixtures

For ultra-high purity (UHP) gases like CF4/O2, the typical lead time is 10-15 working days. This includes precision blending and multi-stage stability testing to ensure the 6N grade purity and concentration accuracy

How do you guarantee the concentration accuracy of the CF4/O2 mixture

We use the gravimetric method (high-precision weighing) during filling, which is the most accurate blending technique. Each cylinder is analyzed via Gas Chromatography (GC) and comes with a Certificate of Analysis (COA) traceable to NIST or national standards

Is this mixture stable given it contains both Hydrogen H2and Oxygen O2

Yes. We strictly follow safety blending protocols where the concentration of flammable and oxidative components is kept within safe limits or balanced with Argon (Ar) to ensure chemical stability and prevent any hazardous reactions inside the cylinder

What type of cylinder and valve are used for this semiconductor gas

We use internally passivated aluminum alloy cylinders or polished stainless steel cylinders to prevent surface adsorption. For 6N grade gases, we typically equip them with DISS (Digital Intelligent Scheduling System) 660 or SS 316L stainless steel valves to ensure zero leakage and prevent contamination

What are the storage requirements for this gas mixture

Cylinders should be stored in a cool, dry, and well-ventilated area, away from direct sunlight and heat sources (temperature < 50° C Ensure the cylinders are secured upright to prevent falling

Do you provide worldwide shipping for hazardous gases

Yes, we specialize in Class 2 hazardous goods logistics. We provide full documentation including MSDS (Material Safety Data Sheet), UN-certified packaging, and DG (Dangerous Goods) declarations for sea or air freight

AGEM presents the Calibration Mixture Gas 99.9999% High Purity CF4/O2 Gas Mixture in Hydrogen & Argon Balance for Semiconductor Plasma Etching, a meticulously engineered solution for precision process control and analytical calibration. This CF4/O2 calibration gas formulation has been developed to meet the most stringent requirements of semiconductor manufacturing, analytical laboratories, and research institutions that demand ultra-stable, ultra-high performance gases. As a product of AIR GAS ELECTRONIC MATERIALS (AGEM), this hydrogen argon balance gas mixture reflects our commitment to quality, rigorous testing, and global supply capabilities. The CF4/O2 calibration gas delivers consistent composition and trace-level accuracy, making it an indispensable tool for process engineers and metrology teams.

Product Overview

The CF4/O2 calibration gas is an ultra-high purity calibration mixture formulated with CF4 and O2 blended in a hydrogen argon balance gas. This high-purity gas for semiconductor etching provides a reliable reference for plasma etching processes and gas analyzers. The hydrogen argon balance gas ensures a stable matrix that mimics process conditions while preserving analytical integrity. The ultra-high purity calibration mixture is bottled and handled under AGEM’s strict quality assurance protocols to guarantee a delivered product that meets 99.9999% purity specifications and performs consistently across batches.

Key Features

- Precise Composition: The CF4/O2 calibration gas is blended to stringent tolerances to provide stable reference concentrations for process calibration and analytical verification. The high-purity gas for semiconductor etching ensures reproducible results in plasma etching tool tuning and gas sensor calibration.

- Hydrogen Argon Balance Gas: Using hydrogen argon balance gas as the carrier matrix provides compatibility with plasma etching environments and analytical instruments, while minimizing interferences and ensuring safety and stability.

- Ultra-High Purity: The ultra-high purity calibration mixture reduces contamination risks and minimizes background noise for sensitive instruments and processes. This high-purity gas for semiconductor etching supports advanced node manufacturing and critical process control.

- Traceability and Certification: Each cylinder of CF4/O2 calibration gas is accompanied by detailed certification, including batch analysis and traceability records, enabling customers to meet auditing and regulatory requirements.

- Robust Packaging and Handling: Cylinders and valves are selected and prepared to minimize contamination and to maintain the integrity of the hydrogen argon balance gas and the CF4/O2 calibration gas throughout transport and storage.

- Global Supply Chain: AGEM’s production and RD capabilities support regional distribution and local technical service, ensuring reliable access to this high-purity gas for semiconductor etching across six served markets.

Applications

The CF4/O2 calibration gas in hydrogen argon balance gas is optimized for multiple semiconductor and analytical applications:

- Semiconductor Plasma Etching: As a high-purity gas for semiconductor etching, this CF4/O2 calibration gas is essential for calibrating process tools, optimizing etch profiles, and ensuring consistent wafer-to-wafer performance.

- Gas Analyzer Calibration: The CF4/O2 calibration gas provides reference standards for gas chromatographs, mass spectrometers, and other analytical equipment used to monitor process gases and emissions.

- Endpoint Detection and Process Control: Using this ultra-high purity calibration mixture allows for more accurate endpoint detection and feedback control in plasma etch processes, reducing defects and improving yield.

- Failure Analysis and R&D: Laboratories conducting failure analysis or research on plasma chemistries benefit from a stable hydrogen argon balance gas matrix with precisely known CF4/O2 concentrations.

- Emissions Monitoring: Facilities managing process emissions can use the CF4/O2 calibration gas for periodic verification and calibration of monitoring systems to ensure compliance.

Technical Advantages and Innovation

AGEM’s CF4/O2 calibration gas offers technical advantages rooted in our manufacturing expertise and quality systems:

- Advanced Blending Precision: Utilizing state-of-the-art mass flow and volumetric blending systems, AGEM achieves exceptional accuracy in producing the CF4/O2 calibration gas, ensuring the specified concentration stability required for critical semiconductor processes.

- Controlled Contamination Management: AGEM’s gas handling protocols, including ultra-clean fill lines, dedicated cylinders, and validated purging procedures, preserve the integrity of this high-purity gas for semiconductor etching from production to point-of-use.

- Matrix Optimization: The selection of hydrogen argon balance gas as the carrier matrix is an innovative choice that combines physical and chemical compatibility with plasma etch environments and analytical instrumentation, delivering reliable calibration behavior and reduced matrix effects.

- Stringent Quality Control: Each lot of the CF4/O2 calibration gas undergoes multi-point verification and analytical testing to confirm concentration and purity targets, resulting in a robust certification package for end-users who require documented assurance.

- Customization and Scalability: AGEM’s RD capabilities allow for customization of CF4/O2 calibration gas concentrations and cylinder configurations to meet unique customer specifications while maintaining the high-purity gas for semiconductor etching standards.

Safety and Compliance

Safety in handling fluorinated gases and reactive mixtures is a priority. AGEM provides comprehensive safety data sheets, cylinder handling guidelines, leak detection recommendations, and storage instructions to ensure safe use of the hydrogen argon balance gas and CF4/O2 calibration gas. AGEM also complies with regional transport and hazardous materials regulations, and the supplied documentation aids customers in meeting local and international compliance requirements.

Quality and Service

As a Taiwan-based manufacturer with global reach, AGEM emphasizes product quality and customer service. The CF4/O2 calibration gas is produced and tested in controlled facilities, benefiting from AGEM’s continuous improvement programs and research-driven enhancements. Customers receive responsive technical support, calibration documentation, and advice on integration with their existing process and analytical infrastructure.

Why Choose AGEM’s CF4/O2 Calibration Gas

- Expertise: AGEM’s specialization in specialty, electronic, bulk, and calibration gases ensures deep domain knowledge in producing CF4/O2 calibration gas and hydrogen argon balance gas formulations.

- Reliability: Rigorous quality control and traceable certification mean customers can rely on consistent performance of the high-purity gas for semiconductor etching.

- Global Support: With distribution and technical service across six regions, AGEM provides dependable access and localized assistance for critical supply chains.

- Innovation: AGEM’s RD-driven approach enables ongoing product enhancements and tailored solutions to meet evolving semiconductor process demands.

AGEM’s Calibration Mixture Gas 99.9999% High Purity CF4/O2 Gas Mixture in Hydrogen & Argon Balance is engineered to deliver the performance, stability, and documentation demanded by modern semiconductor manufacturing and analytical calibration. This CF4/O2 calibration gas, formulated as a high-purity gas for semiconductor etching with a hydrogen argon balance gas, provides a reliable standard for process calibration, analytical verification, and advanced research applications. Trust AGEM for consistent, certified, and safe ultra-high purity calibration mixtures that support precision, yield, and compliance in critical gas-handling environments.