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High Purity 99.999% Octafluorocyclopentene For Semiconductor 4N C5F8 Gas
High Purity 99.999% Octafluorocyclopentene For Semiconductor 4N C5F8 Gas
High Purity 99.999% Octafluorocyclopentene For Semiconductor 4N C5F8 Gas
High Purity 99.999% Octafluorocyclopentene For Semiconductor 4N C5F8 Gas
High Purity 99.999% Octafluorocyclopentene For Semiconductor 4N C5F8 Gas
High Purity 99.999% Octafluorocyclopentene For Semiconductor 4N C5F8 Gas
High Purity 99.999% Octafluorocyclopentene For Semiconductor 4N C5F8 Gas
High Purity 99.999% Octafluorocyclopentene For Semiconductor 4N C5F8 Gas
High Purity 99.999% Octafluorocyclopentene For Semiconductor 4N C5F8 Gas
High Purity 99.999% Octafluorocyclopentene For Semiconductor 4N C5F8 Gas
High Purity 99.999% Octafluorocyclopentene For Semiconductor 4N C5F8 Gas
High Purity 99.999% Octafluorocyclopentene For Semiconductor 4N C5F8 Gas
High Purity 99.999% Octafluorocyclopentene For Semiconductor 4N C5F8 Gas
High Purity 99.999% Octafluorocyclopentene For Semiconductor 4N C5F8 Gas

High Purity 99.999% Octafluorocyclopentene For Semiconductor 4N C5F8 Gas

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C5F8 Octafluorocyclopentene Gas


Widely used in the etching process of semiconductor device manufacturing, especially for the size and selective etching of the smallest geometric features (such as the width of interconnect lines, contacts, trenches, etc.)
 
 

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