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Mō te Mahi Pūtahi Rangahau Pūraho Plasma Deposition Gas āngoa me te Etchant 99.9% C318 Perfluorocyclobutane Whakamānawa āngoa C4F8
I te whakahaere i ngā rauemi pūraho me ngā whatu, ko te octafluorocyclobutane he āngoa whakaputu me etchant. Kua kitea hoki hei whakamānawa i ngā tūmomo matihiko, hei whakatūpuku mō ngā whakamānawa chlorofluorocarbon e kore nei i te whakarerekē ki te ozone. Ki te whakamahi i tana kotipoti me te kore whakapono, ka kitea te octafluorocyclobutane i rohe āhua atu o ngā kai āhua. Koia nei i whakaritea e te Codex Alimentarius i runga i te tau 946 (E946 mō te EU). Kua kitea ia hei whakatūpuku mō te sulfurhexafluoride hei rākau whakaputu.
C4F8, HALOCARBON C318 99.8% G 10LBS, C4F8, Semiconductor Process Gas, Whai wāhi i: Electronics, Semiconductor Process, Dopant, Etchant, Reactant, Fabrication, Reactors, Silicon-Precursor, Gases, Purge, Pure, Standards, Refrigerants - HA C3183.
