Whakapiri Kairaruraru Oxide Matatika Komene Ika Hangaia Gases Perfluoro 2 butyne H 2316 Perfluoro2butyne C4F6
Ko te Hexafluoro1,3‐butadiene he mea kai, e kore e kitea te tae, kaore i te ira, me te ahi, he waihanga haere riro i te hau.
I mua atu i ngā tau o te rangahau, kua whakaatuia he takitahi nui ngā pūtake pai mō te whakarite kiriwhara i ngā momo kiriwhara-whakaheke:
He etch rate me te tohu taupūtahi nui ake tonu tēnei i runga i te octafluorocyclobutane (c-C4F8 – H318), ko tētahi hoki hei whakarite i te kiriwhara-silicon. Ki te kore rawa C4F8 (H318), ki te mea ko C4F6 (H2316), ko te taha anake o te dielectric substrate te whakarite. Ko te whakarite i te rārangi e hohou ana i te rārangi nui ake, e hiahiatia ana ngā rua iti i te whakarite i te c-C4F8. Kua heke iho ngā whakaputu VOC: ko te C4F6 (H2316) he waewae ā-muri iti noa i te ao, kāore i te hirikore i te āhua o te rangi.
Whakamahinga:
Te whakapono tuarua o ngā pūnaha matua e hia顿 te hanga mahi LSI hei iti i te roa o ngā raeta ki uta nei. E whakamahi ana te waea etching kiharoa i te mahi etching o ngā poaka pakitara rorohiko. Mo ngā waea waipuke e noho tonu ana i te ture CxFy, ko te mea iti rawa atu te uara F/C, ko te mea nui ake ngā hōputu CF2. Ki te whakatauhia mai he iti ake te uara F/C o te C4F6 i te wharewharenga C2F6 C3F8, ka nui ake ngā hōputu CF2, kei reira ka etching ake nui rawa atu i te kiri purea. No reira, ko te C4F6 he nui ake tana tohu ki te kiri purea, me te whanaketanga tuhinga ake.