High Purity 99.999% 10L 8L C4f6 Hexafluorobutadiene Gas Supply for High-Tech Applications Electronics Manufacturing

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Electronic Grade Purity for Semiconductor Manufacturing Our C4F6 is available in ultra high purity grades up to 5N 99.999 percent featuring extremely low impurity levels including Oxygen O2 Moisture H2O and Hydrocarbons ensuring superior plasma stability consistent etching performance and high process repeatability required for advanced semiconductor device fabrication Optimized for Advanced Plasma Etching Applications C4F6 is specifically designed for high precision plasma etching processes including dielectric etching oxide layer etching low k material patterning and critical dimension control offering superior selectivity anisotropic etching capability and improved profile accuracy compared to conventional fluorocarbon gases such as CF4 C2F6 and C3F8 making it ideal for advanced logic memory and MEMS manufacturing Low Global Warming Potential GWP Alternative Compared with traditional perfluorocarbon gases C4F6 provides higher etching efficiency lower gas consumption and reduced environmental impact helping semiconductor manufacturers achieve sustainability goals while maintaining high production performance and yield Strict Impurity and Moisture Control We utilize advanced gas purification systems precision analytical instruments and strict quality control protocols to ensure Moisture H2O less than or equal to 1 ppm Oxygen O2 less than or equal to 1 ppm and Total Hydrocarbons less than or equal to 1 ppm effectively preventing wafer contamination plasma instability and process defects ensuring consistent and reliable semiconductor processing performance Certified Cylinders with Semiconductor Grade Surface Treatment Our C4F6 is supplied in standard 47L 10L and customized cylinder sizes manufactured in compliance with ISO 9809 DOT 3AA and TPED EN standards with optional internal electropolishing and passivation treatment to minimize particle generation prevent gas contamination and maintain ultra high gas purity during storage and use

About Us

AGEM was established in 2008 as a multinational professional manufacturer and service provider of gas equipment, headquartered in Taiwan, China. With 16 years of dedicated industry expertise, its global footprint, superior manufacturing craftsmanship, and comprehensive product portfolio have solidified its status as a benchmark enterprise in the gas equipment sector. The company adheres to a globalization development strategy, establishing modern production bases in Chinese Mainland, Taiwan, China, and India, forming a production and service network that covers Asia and extends globally. Each base is equipped with intelligent production lines and precision testing equipment, enabling full-process control from raw material processing to finished product delivery. With annual production capacity consistently ranking among industry leaders, the company can swiftly respond to the diverse needs of global clients. The core business focuses on gas-related core equipment, encompassing a full range of products including various industrial gases, specialized gas valves, high-pressure cylinders, lightweight aluminum cylinders, and high-precision pressure reducers. These products are widely applied in critical sectors such as chemicals, electronics, healthcare, and energy. Leveraging profound technical expertise, the products have obtained ISO9001 Quality Management System certification and multiple authoritative international certifications, including ASME certification for high-pressure equipment, CE-PED certification for EU market access, and IECEx explosion-proof certification for global application. Key performance indicators such as sealing performance, pressure resistance, and safety protection have achieved internationally advanced levels. The company consistently prioritizes technological innovation as its core competitive strength, assembling an international R&D team and continuously investing in technological breakthroughs.

FAQs

What purity grades of C4F6 do you offer

We offer semiconductor grade C4F6 including 4N 99.99 percent 4.5N 99.995 percent and 5N 99.999 percent Higher purity grades are available upon request

What are the typical applications of C4F6

C4F6 is mainly used in semiconductor plasma etching dielectric layer etching oxide etching processes low k dielectric etching MEMS manufacturing and advanced integrated circuit fabrication

What cylinder sizes are available

Standard packaging includes 47L cylinder 10L cylinder 8L cylinder and customized cylinders upon request Cylinder internal electropolishing is available for semiconductor applications

What is the typical filling pressure and filling weight

Typical filling parameters include filling pressure up to 13 to 15 MPa and filling weight approximately 20 to 25 kg in 47L cylinder Exact filling weight depends on purity grade and customer requirements

What valve type is used for C4F6 cylinders

Common valve types include CGA 716 DISS 716 and customized semiconductor grade valves Valve selection can be customized based on regional standards

How do you ensure gas purity and stability

We ensure quality through advanced gas purification systems moisture and oxygen removal technology gas chromatography GC analysis and Certificate of Analysis COA provided with each cylinder

What is the lead time for delivery

Typical delivery time is 15 to 25 days after receiving deposit Faster delivery is available depending on stock availability and cylinder preparation

What certifications do your cylinders comply with

Our cylinders comply with ISO 9809 DOT 3AA TPED and EN standards Third party inspection is available upon request